
MOSFET Characterization for Advanced Semiconductor Research – Universitas Indonesia – Nanoelectronic Lab
Background The Nanoelectronic Laboratory at Universitas Indonesia required a high-precision MOSFET characterization solution to support its semiconductor research. Characterizing current-voltage (I-V) characteristics, gate leakage, and breakdown voltage are critical parameters for evaluating the performance and reliability of semiconductor devices. The primary challenge was performing ultra-low current and voltage measurements, which are beyond the capabilities of standard laboratory instruments. Challenges Haliatech

